AM
Adriaan J. M. Mackus
cs.AIarea-selective depositionatomic layer depositioncs.CLcs.DLsilicon oxide2D transition metal chalcogenide3D nanostructureatomic layer deposition (ALD)atomic layer etching
On Valency
published · living versionsW_pj3pk4n5·v1 · currentpublished
Mined from Scientific Literature: Process Schemas for Atomic Layer Deposition and Etching in Materials Science
with Sameer Sadruddin, Eleni Poupaki, Alex Watkins, Bora Karasulu +3
1 version
Preprints & journals
29 papers in the corpus · 2012–2026Mined from Scientific Literature: Process Schemas for Atomic Layer Deposition and Etching in Materials Science2609.12139v1 · Sameer Sadruddin, Eleni Poupaki, Alex Watkins et al.2026 · 0 citationsarXivon Valency
AdsorPy: A Python Package for Lattice-Based Random Sequential Adsorption Simulations.42235934 · Maas, Joost F W, Tezsevin, Ilker, Merkx, Marc J M et al.2026 · 0 citationsJournal of chemical theory and computation. 2026;22(12):5930-5944
Publishing FAIR and Machine-actionable Reviews in Materials Science: The Case for Symbolic Knowledge in Neuro-symbolic Artificial Intelligence2601.05051v1 · Jennifer D'Souza, Soren Auer, Eleni Poupaki et al.2026 · 0 citationsarXiv
Growth behavior during metalorganic chemical vapor deposition of MoS2using di-tert-butyl sulfide as organic sulfur precursor.41406495 · Deijkers, Sanne, Medina Silva, Henry, Manasi, Apostolia et al.2025 · 2 citationsNanotechnology. 2025
Area-Selective Atomic Layer Deposition through Selective Passivation of SiO2 with a SF6/H2 Plasma.40717791 · Bolkenbaas, Olaf C A, Merkx, Marc J M, Chittock, Nicholas J et al.2025 · 3 citationsChemistry of materials : a publication of the American Chemical Society. 2025;37(14):4982-4991
LLMs4SchemaDiscovery: A Human-in-the-Loop Workflow for Scientific Schema Mining with Large Language Models2504.00752v1 · Sameer Sadruddin, Jennifer D'Souza, Eleni Poupaki et al.2025 · 8 citationsarXiv
Investigation of the atomic layer etching mechanism for Al2O3 using hexafluoroacetylacetone and H2 plasma.39583983 · Chittock, Nicholas J, Maas, Joost F W, Tezsevin, Ilker et al.2025 · 19 citationsJournal of materials chemistry. C. 2025;13(3):1345-1358
The Consequences of Random Sequential Adsorption for the Precursor Packing and Growth-Per-Cycle of Atomic Layer Deposition Processes.39013106 · Tezsevin, I, Deijkers, J H, Merkx, M J M et al.2024 · 12 citationsThe journal of physical chemistry letters. 2024;15(29):7496-7501
In situ formation of inhibitor species through catalytic surface reactions during area-selective atomic layer deposition of TaN.38775743 · Merkx, Marc J M, Tezsevin, Ilker, Yu, Pengmei et al.2024 · 12 citationsThe Journal of chemical physics. 2024;160(20)
Computational Investigation of Precursor Blocking during Area-Selective Atomic Layer Deposition Using Aniline as a Small-Molecule Inhibitor.36921108 · Tezsevin, I, Maas, J F W, Merkx, M J M et al.2023 · 33 citationsLangmuir : the ACS journal of surfaces and colloids. 2023;39(12):4265-4273
Surface Smoothing by Atomic Layer Deposition and Etching for the Fabrication of Nanodevices.36583128 · Gerritsen, Sven H, Chittock, Nicholas J, Vandalon, Vincent et al.2023 · 60 citationsACS applied nano materials. 2022;5(12):18116-18126
Relation between Reactive Surface Sites and Precursor Choice for Area-Selective Atomic Layer Deposition Using Small Molecule Inhibitors.35330759 · Merkx, Marc J M, Angelidis, Athanasios, Mameli, Alfredo et al.2022 · 61 citationsThe journal of physical chemistry. C, Nanomaterials and interfaces. 2022;126(10):4845-4853
Surface Chemistry during Atomic Layer Deposition of Pt Studied with Vibrational Sum-Frequency Generation.35178137 · Vandalon, V, Mackus, A J M, Kessels, W M M2024 · 28 citationsThe journal of physical chemistry. C, Nanomaterials and interfaces. 2022;126(5):2463-2474
Reaction Mechanisms during Atomic Layer Deposition of AlF3 Using Al(CH3)3 and SF6 Plasma.33815650 · Vos, Martijn F J, Knoops, Harm C M, Kessels, Wilhelmus M M et al.2021 · 18 citationsThe journal of physical chemistry. C, Nanomaterials and interfaces. 2021;125(7):3913-3923
Nanoscale Encapsulation of Perovskite Nanocrystal Luminescent Films via Plasma-Enhanced SiO2 Atomic Layer Deposition.33174735 · Jing, Yao, Merkx, Marc J M, Cai, Jiaming et al.2020 · 36 citationsACS applied materials & interfaces. 2020;12(47):53519-53527
Area-Selective Atomic Layer Deposition of Two-Dimensional WS2 Nanolayers.32421046 · Balasubramanyam, Shashank, Merkx, Marc J M, Verheijen, Marcel A et al.2020 · 86 citationsACS materials letters. 2020;2(5):511-518
Synthesis of a Hybrid Nanostructure of ZnO-Decorated MoS2 by Atomic Layer Deposition.31967453 · Oh, Il-Kwon, Kim, Woo-Hee, Zeng, Li et al.2020 · 47 citationsACS nano. 2020;14(2):1757-1769
From the Bottom-Up: Toward Area-Selective Atomic Layer Deposition with High Selectivity.30774194 · Mackus, Adriaan J M, Merkx, Marc J M, Kessels, Wilhelmus M M2020 · 427 citationsChemistry of materials : a publication of the American Chemical Society. 2019;31(1):2-12
Isotropic Atomic Layer Etching of ZnO Using Acetylacetone and O2 Plasma.30286289 · Mameli, A, Verheijen, M A, Mackus, A J M et al.2019 · 60 citationsACS applied materials & interfaces. 2018;10(44):38588-38595
Atomic Layer Deposition of Cobalt Using H2-, N2-, and NH3-Based Plasmas: On the Role of the Co-reactant.30319724 · Vos, Martijn F J, van Straaten, Gerben, Kessels, W M M Erwin et al.2020 · 54 citationsThe journal of physical chemistry. C, Nanomaterials and interfaces. 2018;122(39):22519-22529
Area-Selective Atomic Layer Deposition of Metal Oxides on Noble Metals through Catalytic Oxygen Activation.29503508 · Singh, Joseph A, Thissen, Nick F W, Kim, Woo-Hee et al.2019 · 120 citationsChemistry of materials : a publication of the American Chemical Society. 2018;30(3):663-670
Area-Selective Atomic Layer Deposition of SiO2 Using Acetylacetone as a Chemoselective Inhibitor in an ABC-Type Cycle.28850774 · Mameli, Alfredo, Merkx, Marc J M, Karasulu, Bora et al.2018 · 203 citationsACS nano. 2017;11(9):9303-9311
Incomplete elimination of precursor ligands during atomic layer deposition of zinc-oxide, tin-oxide, and zinc-tin-oxide.28178803 · Mackus, Adriaan J M, MacIsaac, Callisto, Kim, Woo-Hee et al.2018 · 87 citationsThe Journal of chemical physics. 2017;146(5):052802
Area-Selective Atomic Layer Deposition of In2O3:H Using a μ-Plasma Printer for Local Area Activation.28405058 · Mameli, Alfredo, Kuang, Yinghuan, Aghaee, Morteza et al.2019 · 71 citationsChemistry of materials : a publication of the American Chemical Society. 2017;29(3):921-925
Tandem Core-Shell Si-Ta3N5 Photoanodes for Photoelectrochemical Water Splitting.27960454 · Narkeviciute, Ieva, Chakthranont, Pongkarn, Mackus, Adriaan J M et al.2018 · 109 citationsNano letters. 2016;16(12):7565-7572
A Process for Topographically Selective Deposition on 3D Nanostructures by Ion Implantation.26950397 · Kim, Woo-Hee, Minaye Hashemi, Fatemeh Sadat, Mackus, Adriaan J M et al.2017 · 102 citationsACS nano. 2016;10(4):4451-8
Atomic layer deposition of Pd and Pt nanoparticles for catalysis: on the mechanisms of nanoparticle formation.26636744 · Mackus, Adriaan J M, Weber, Matthieu J, Thissen, Nick F W et al.2016 · 118 citationsNanotechnology. 2016;27(3):034001
The use of atomic layer deposition in advanced nanopatterning.25156884 · Mackus, A J M, Bol, A A, Kessels, W M M2015 · 380 citationsNanoscale. 2014;6(19):10941-60
Nanopatterning by direct-write atomic layer deposition.22760689 · Mackus, A J M, Dielissen, S A F, Mulders, J J L et al.2012 · 73 citationsNanoscale. 2012;4(15):4477-80
Career total: 147 works. 29 are in this corpus.
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